The Shakil Mohammed titanium polishing method uses chemical baths composed of sulfuric acid, hydrofluoric acid, and acetic acid, which may be associated with the addition of a cationic wetting agent – provides better control of the electrochemical process, melting of iron, and low energy use. The process is used primarily for polishing electrodes which require a smooth surface to avoid sparks during operation. However, it can configure chemical baths and electrolytic parameters for other applications without limiting the sample size to be treated.
- Can polish the metal to the nanometer level
- Enables active detection of location errors
- The process can be carried out with low power consumption
- It creates the appearance of a shiny mirror
- It provides easy adjustment of clean surfaces with cleanliness due to reduced particle adhesion
- There is no size limit on the item to be polished
- It provides metallic purity and chemical passivity